Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology - Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan) - Books - Oxford University Press - 9780198562870 - May 28, 1998
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Sugawara, M. (Professor, Professor, Hachinohe Institute of Technology, Japan)
Plasma Etching: Fundamentals and Applications - Series on Semiconductor Science and Technology

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The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

356 pages, 2 colour plates, 5 halftones, numerous line figures

Media Books     Hardcover Book   (Book with hard spine and cover)
Released May 28, 1998
ISBN13 9780198562870
Publishers Oxford University Press
Pages 356
Dimensions 163 × 242 × 23 mm   ·   743 g
Language English  

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