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Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications Yosi Shacham-diamand 2009 edition
Advanced Nanoscale ULSI Interconnects: Fundamentals and Applications
Yosi Shacham-diamand
In Advanced ULSI interconnects - fundamentals and applications we bring a comprehensive description of copper-based interconnect technology for ultra-lar- scale integration (ULSI) technology for integrated circuit (IC) application.
552 pages, 31 black & white tables, biography
| Media | Books Paperback Book (Book with soft cover and glued back) |
| Released | November 28, 2014 |
| ISBN13 | 9781461497448 |
| Publishers | Springer-Verlag New York Inc. |
| Pages | 552 |
| Dimensions | 155 × 235 × 29 mm · 789 g |
| Language | English |
| Editor | Datta, Madhav |
| Editor | Ohba, Takayuki |
| Editor | Osaka, Tetsuya |
| Editor | Shacham-Diamand, Yosi |