Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566 - MRS Proceedings - - Books - Materials Research Society - 9781558994737 - February 10, 2000
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Chemical-Mechanical Polishing – Fundamentals and Challenges: Volume 566 - MRS Proceedings

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This book brings together many of the active players in the field to focus on the interdisciplinary nature of these challenges. It reflects, to some extent, the role played by both academic institutions and multinational corporations in opening up the frontiers in the field of CMP for wider dissemination. Both experimental and theoretical contributions are included.

281 pages

Media Books     Hardcover Book   (Book with hard spine and cover)
Released February 10, 2000
ISBN13 9781558994737
Publishers Materials Research Society
Pages 296
Dimensions 157 × 234 × 23 mm   ·   591 g
Language English  
Editor Babu, S. V. (Clarkson University, New York)
Editor Danyluk, S. (Georgia Institute of Technology)
Editor Krishnan, M. (IBM T J Watson Research Center, New York)
Editor Tsujimura, M.