Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses - Guilei Wang - Books - Springer Verlag, Singapore - 9789811500480 - October 2, 2020
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Guilei Wang
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond - Springer Theses 2019 edition

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115 pages, 40 Tables, color; XVI, 115 p.

Media Books     Paperback Book   (Book with soft cover and glued back)
Released October 2, 2020
ISBN13 9789811500480
Publishers Springer Verlag, Singapore
Pages 115
Dimensions 150 × 220 × 10 mm   ·   215 g

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