Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering - W. N. G. Hitchon - Books - Cambridge University Press - 9780521018005 - September 29, 2005
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W. N. G. Hitchon
Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering

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Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

232 pages, 31 b/w illus. 2 tables 33 exercises

Media Books     Paperback Book   (Book with soft cover and glued back)
Released September 29, 2005
ISBN13 9780521018005
Publishers Cambridge University Press
Pages 232
Dimensions 178 × 254 × 14 mm   ·   414 g
Language English  
Series Editor Ahmad, Haroon
Series Editor Broers, Alec
Series Editor Pepper, Michael

See all of W. N. G. Hitchon ( e.g. Paperback Book and Hardcover Book )