Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering - W. N. G. Hitchon - Books - Cambridge University Press - 9780521591751 - January 28, 1999
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W. N. G. Hitchon
Plasma Processes for Semiconductor Fabrication - Cambridge Studies in Semiconductor Physics and Microelectronic Engineering

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Self-contained book providing an up-to-date description of plasma etching and deposition in semiconductor fabrication. Presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. Suitable as a graduate-level textbook, and will also be a useful reference for practising engineers in the semiconductor industry.

232 pages, 31 b/w illus. 2 tables 33 exercises

Media Books     Hardcover Book   (Book with hard spine and cover)
Released January 28, 1999
ISBN13 9780521591751
Publishers Cambridge University Press
Pages 232
Dimensions 180 × 259 × 18 mm   ·   650 g
Language English  

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