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High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs) 1st edition
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High-k Gate Dielectric Materials: Applications with Advanced Metal Oxide Semiconductor Field Effect Transistors (MOSFETs)
This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS).
246 pages, 18 Tables, black and white; 24 Illustrations, color; 79 Illustrations, black and white
| Media | Books Hardcover Book (Book with hard spine and cover) |
| Released | December 18, 2020 |
| ISBN13 | 9781771888431 |
| Publishers | Apple Academic Press Inc. |
| Pages | 264 |
| Dimensions | 150 × 220 × 20 mm · 650 g |
| Language | English |
| Editor | Baishya, Srimanta (National Institute of Technology, India) |
| Editor | Maity, Reshmi (Mizoram University, India) |
| Editor | Pratap Maity, Niladri (Mizoram University, India) |
